Sputtering Deposition Techniques Help Increase Coating Efficiency

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Published: 24 Feb 2017

Sputtering is a deposition process in which ionized gas molecule is used to displace atoms of a specific material (which is called the target) and is then deposited on to a substrate in a high energy environment. The target material forms a very strong bond at the atomic level to the substrate and can help create long lasting, durable substrates. This deposition technique is used across industries with high impact applications being semiconductor, electronics, medical, solar, and telecommunications. The Advanced Coating & Surface Technology TechVision Opportunity Engine (TOE) provides intelligence on technologies, products, processes, applications and strategic insights on various coatings across industries. This encompasses protective and functional coatings such as antimicrobial coatings, food coatings, energy-saving coatings, smart glazing, hydrophilic, hydrophobic and super hydrophobic coatings, corrosion protection coatings, barrier coatings and paints. The Chemicals and Advanced Materials cluster tracks research & innovation trends and developments across specialty chemicals, plastics, polymers, chemicals, bio-chemicals, metals, coatings, thin films, surface treatments, composites, alloys, oil and gas, fuel additives, fibers and several other related technologies and its impact and application across industries. Keywords: Sputtering, coating method, physical vapor deposition

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